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Showing results 1 to 23 of 23

Issue Date	Title Author(s) Journal	View
2012-10	A bilayer diffusion barrier of Ru/WSixNy for advanced Cu interconnects Eom, Tae-Kwang ; Sari, Windu ; Cheon, Taehoon ; Kim, Soo-Hyun ; Kim, Woo Kyoung Elsevier BV, 2012-10	651
2013-01	Atomic Layer Deposition of Ru Thin Films Using a Ru(0) Metallorganic Precursor and O-2 Hong, Tae Eun ; Choi, Sang-Hyeok ; Yeo, Seungmin ; Park, Ji-Yoon ; Kim, Soo-Hyun ; Cheon, Taehoon ; Kim, Hoon ; Kim, Min-Kyu ; Kim, Hyungjun ECS Journal of Solid State Science and Technology, v.2, no.3, pp.P47 - P53, 2013-01	429
2021-07-06	Atomic layer deposition of RuO2 using a new metalorganic precursor as a diffusion barrier for Ru interconnect Kim, Youn-Hye ; Kotsugi, Yohei ; Cheon, Taehoon ; Ramesh, Rahul ; Kim, Soo-Hyun 24th Annual IEEE International Interconnect Technology Conference, IITC 2021, 2021-07-06	9
2013-11	Atomic layer deposition of ruthenium (Ru) thin films using ethylbenzen-cyclohexadiene Ru(0) as a seed layer for copper metallization Yeo, Seungmin ; Choi, Sang-Hyeok ; Park, Ji-Yoon ; Kim, Soo-Hyun ; Cheon, Taehoon ; Lim, Byoung-Yong ; Kim, Sunjung Elsevier BV, 2013-11	592
2021-06	Atomic Layer Modulation of Multicomponent Thin Films through Combination of Experimental and Theoretical Approaches Nguyen, Chi Thang ; Gu, Bonwook ; Cheon, Taehoon ; Park, Jeongwoo ; Khan, Mohammad Rizwan ; Kim, Soo-Hyun ; Shong, Bonggeun ; Lee, Han-Bo-Ram Chemistry of Materials, v.33, no.12, pp.4435 - 4444, 2021-06	211
2019-05	Atomic-Layer-Deposited MoN x Thin Films on Three-Dimensional Ni Foam as Efficient Catalysts for the Electrochemical Hydrogen Evolution Reaction Ramesh, Rahul ; Nandi, Dip K. ; Kim, Tae Hyun ; Cheon, Taehoon ; Oh, Jihun ; Kim, Soo-Hyun American Chemical Society, 2019-05	548
2013-05	Characteristics ofMoSe(2) formation during rapid thermal processing ofMo-coated glass Lee, Soobin ; Koo, Jaseok ; Kim, Sammi ; Kim, Soo-Hyun ; Cheon, Taehoon ; Oh, Jong Seok ; Kim, Suk Jin ; Kim, Woo Kyoung Elsevier, 2013-05	469
2018-03	Cobalt titanium nitride amorphous metal alloys by atomic layer deposition Nam, Taewook ; Lee, Chang Wan ; Cheon, Taehoon ; Lee, Woo Jae ; Kim, Soo-Hyun ; Kwon, Se-Hun ; Lee, Han-Bo-Ram ; Kim, Hyungjun Journal of Alloys and Compounds, v.737, pp.684 - 692, 2018-03	269
2018-03	Detailed Visualization of Phase Evolution during Rapid Formation of Cu(InGa)Se-2 Photovoltaic Absorber from Mo/CuGa/In/Se Precursors Koo, Jaseok ; Kim, Sam Mi ; Cheon, Tae Hoon ; Kim, Soo-Hyun ; Kim, Woo Kyoung Scientific Reports, v.8, 2018-03	432
2022-09	Development of RuS2 for near-infrared photodetector by atomic layer deposition and post-sulfurization Nakazawa, Tatsuya ; Kim, Donghyun ; Kim, Jaehyeok ; Kotsugi, Yohei ; Cheon, Taehoon ; Chung, Seung-Min ; Kim, Soo-Hyun ; Kim, Hyungjun Rare Metals, v.41, no.9, pp.3086 - 3099, 2022-09	108
2019-07	Enhanced activity of highly conformal and layered tin sulfide (SnSx) prepared by atomic layer deposition (ALD) on 3D metal scaffold towards high performance supercapacitor electrode Ansari, Mohd Zahid ; Parveen, Nazish ; Nandi, Dip K. ; Ramesh, Rahul ; Ansari, Sajid Ali ; Cheon, Taehoon ; Kim, Soo-Hyun Nature Publishing Group, 2019-07	650
2014-10-15	Growth of highly conformal ruthenium-oxide thin films with enhanced nucleation by atomic layer deposition Park, Ji-Yoon ; Yeo, Seungmin ; Cheon, Taehoon ; Kim, Soo-Hyun ; Kim, Min-Kyu ; Kim, Hyungjun ; Hong, Tae Eun ; Lee, Do-Joong Journal of Alloys and Compounds, v.610, pp.529 - 539, 2014-10-15	594
2013-04	Growth of Highly Conformal TiCx Films Using Atomic Layer Deposition Technique Hong, Tae Eun ; Choi, Sang-Kyung ; Kim, Soo-Hyun ; Cheon, Taehoon Journal of the American Ceramic Society, v.96, no.4, pp.1060 - 1062, 2013-04	474
2023-11	Layer Engineered MXene Empowered Wearable Pressure Sensors for Non-Invasive Vital Human–Machine Interfacing Healthcare Monitoring Mohapatra, Debananda ; Byun, Jeong Eun ; Ansari, Mohd Zahid ; Kim, Haekyoung ; Cheon, Taehoon ; Jang, Jongmoon ; Cho, Young-Rae ; Lee, Jung Woo ; Kim, Soo-Hyun Advanced Materials Technologies, v.8, no.24, 2023-11	25
2009	Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2 Eom, Tae-Kwang ; Sari, Windu ; Choi, Kyu-Jeong ; Shin, Woong-Chul ; Kim, Jae Hyun ; Lee, Do-Joong ; Kim, Ki-Bum ; Sohn, Hyunchul ; Kim, Soo-Hyun Electrochemical and Solid State Letters, v.12, no.11, pp.D85 - D88, 2009	588
2009	Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2 Eom, Tae-Kwang ; Sari, Windu ; Choi, Kyu-Jeong ; Shin, Woong-Chul ; Kim, Jae Hyun ; Lee, Do-Joong ; Kim, Ki-Bum ; Sohn, Hyunchul ; Kim, Soo-Hyun Electrochemical and Solid State Letters, v.12, no.11, pp.D85 - D88, 2009	48
2019-11	Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices Ansari, Mohd Zahid ; Nandi, Dip K. ; Janicek, Petr ; Ansari, Sajid Ali ; Ramesh, Rahul ; Cheon, Taehoon ; Shong, Bonggeun ; Kim, Soo-Hyun ACS Applied Materials & Interfaces, v.11, no.46, pp.43608 - 43621, 2019-11	553
2023-05	Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor Ansari, Mohd Zahid ; Janicek, Petr ; Park, Ye Jin ; NamGung, Sook ; Cho, Bo Yeon ; Nandi, Dip K. ; Jang, Yujin ; Bae, Jong-Seong ; Hong, Tae Eun ; Cheon, Taehoon ; et al Applied Surface Science, v.620, 2023-05	47
2023-04	Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring Mohapatra, Debananda ; Shin, Yujin ; Ansari, Mohd Zahid ; Kim, Youn-Hye ; Park, Ye Jin ; Cheon, Taehoon ; Kim, Haekyoung ; Lee, Jung Woo ; Kim, Soo-Hyun Advanced Science, v.10, no.12, 2023-04	28
2020-02	Rate performance enhancement of lithium-ion battery using precise thickness-controllable-carbon-coated titanium dioxide nanowire array electrode via atomic layer deposition Choi, Taejin ; Kim, Seong Dae ; Yeo, Seungmin ; Cheon, Taehoon ; Kim, Soo-Hyun ; Ahn, Jong-Hyun ; Kim, Hyungjun Electrochimica Acta, v.334, pp.135596, 2020-02	519
2014-07-01	The effects of nitrogen incorporation on the properties of atomic layer deposited Ru thin films as a direct-plateable diffusion barrier for Cu interconnect Mun, Ki-Yeung ; Hong, Tae Eun ; Cheon, Taehoon ; Jang, Yujin ; Lim, Byoung-Yong ; Kim, Sunjung ; Kim, Soo-Hyun Thin Solid Films, v.562, pp.118 - 125, 2014-07-01	498
2019-11	Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery Nandi, Dip K. ; Yeo, Seungmin ; Ansari, Mohd Zahid ; Sinha, Soumyadeep ; Cheon, Taehoon ; Kwon, Jiseok ; Kim, Hyungjun ; Heo, Jaeyeong ; Song, Taeseup ; Kim, Soo-Hyun Elsevier Ltd, 2019-11	556
2021-02	Ultralow Loading (Single-Atom and Clusters) of the Pt Catalyst by Atomic Layer Deposition Using Dimethyl ((3,4-eta) N,N-dimethyl-3-butene-1-amine-N) Platinum (DDAP) on the High-Surface-Area Substrate for Hydrogen Evolution Reaction Ramesh, Rahul ; Han, Seungmin ; Nandi, Dip K. ; Sawant, Sandesh Y. ; Kim, Deok Hyun ; Cheon, Taehoon ; Cho, Moo Hwan ; Harada, Ryosuke ; Shigetomi, Toshiyuki ; Suzuki, Kazuharu ; et al Advanced Materials Interfaces, v.8, no.3, pp.2001508, 2021-02	358

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